SiO[sub 2] thin film deposition by radio frequency oxygen plasma enhanced laser ablation from Si

Chen, T.P.; Tien-I Bao
November 1993
Applied Physics Letters;11/1/1993, Vol. 63 Issue 18, p2475
Academic Journal
Demonstrates the room temperature deposition of thin silicon dioxide film by reactive laser ablation from a c-silicon target in a cw low pressure oxygen radio frequency magnetron plasma. Significance on the reactivity of an oxygen gas; Description on the radio frequency hollow oval magnetron system; Demonstration of water free film deposition.


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