Correlation between target-substrate distance and oxygen pressure in pulsed laser deposition of

Kim, H.S.; Kwok, H.S.
November 1992
Applied Physics Letters;11/2/1992, Vol. 61 Issue 18, p2234
Academic Journal
Focuses on the existence of optimal target-substrate distance for each deposition oxygen pressure in pulsed laser deposition. Necessity of the optimal target-substrates distance for the growth of high quality superconducting films; Role of plasma dynamics in forming superconducting films; Achievement of scaling law of PD[sup 2]=constant.


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