TITLE

Copper diffusion in amorphous thin films of 4% phosphorus-silicate glass and hydrogenated silicon

AUTHOR(S)
Gutta, D.; Verruga, K.
PUB. DATE
November 1992
SOURCE
Applied Physics Letters;11/2/1992, Vol. 61 Issue 18, p2178
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the diffusion of copper metal in amorphous thin films. Growth of thin films on oxidized silicon wafers by chemical vapor deposition technique; Application of copper radiotracer diffusion techniques in thin films; Description of the copper diffusion coefficients; Consideration of copper diffusion in device designs.
ACCESSION #
4221357

 

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