Copper diffusion in amorphous thin films of 4% phosphorus-silicate glass and hydrogenated silicon

Gutta, D.; Verruga, K.
November 1992
Applied Physics Letters;11/2/1992, Vol. 61 Issue 18, p2178
Academic Journal
Examines the diffusion of copper metal in amorphous thin films. Growth of thin films on oxidized silicon wafers by chemical vapor deposition technique; Application of copper radiotracer diffusion techniques in thin films; Description of the copper diffusion coefficients; Consideration of copper diffusion in device designs.


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