Organometallic chemical vapor deposition of tungsten metal, and suppression of carbon

Niemer, Burkhard; Zinn, Alfred A.
October 1992
Applied Physics Letters;10/12/1992, Vol. 61 Issue 15, p1793
Academic Journal
Examines the production of tungsten films through decomposition of bis-cyclopentadienyltungstendihydride. Use of organometallic chemical vapor deposition of to reduce carbon and oxygen content of the films; Presence of x-ray diffraction patterns of the metal; Details on platinum concentration in the films.


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