TITLE

Organometallic chemical vapor deposition of tungsten metal, and suppression of carbon

AUTHOR(S)
Niemer, Burkhard; Zinn, Alfred A.
PUB. DATE
October 1992
SOURCE
Applied Physics Letters;10/12/1992, Vol. 61 Issue 15, p1793
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the production of tungsten films through decomposition of bis-cyclopentadienyltungstendihydride. Use of organometallic chemical vapor deposition of to reduce carbon and oxygen content of the films; Presence of x-ray diffraction patterns of the metal; Details on platinum concentration in the films.
ACCESSION #
4221315

 

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