TITLE

Low-gas-pressure sputtering by means of microwave-enhanced magnetron plasma excited by electron

AUTHOR(S)
Yoshida, Yoshikazu
PUB. DATE
October 1992
SOURCE
Applied Physics Letters;10/5/1992, Vol. 61 Issue 14, p1733
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Presents a sputtering source utilizing electron cyclotron resonance (ECR) microwave and direct current planar magnetron plasmas. Introduction of the microwave power into the plasma; Placement of the magnetron cathode on the open end of the inner conductor; Application of the ECR magnetic field in the open end.
ACCESSION #
4221298

 

Related Articles

Share

Read the Article

Courtesy of VIRGINIA BEACH PUBLIC LIBRARY AND SYSTEM

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics