TITLE

Effect of silicon source gas on silicon-germanium chemical vapor deposition kinetics at

AUTHOR(S)
Kamins, T.I.; Meyer, D.J.
PUB. DATE
July 1992
SOURCE
Applied Physics Letters;7/6/1992, Vol. 61 Issue 1, p90
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the effect of silicon source gas on silicon-germanium (SiGe) chemical vapor deposition kinetics at atmospheric pressure. Details on the deposition kinetics of SiGe alloy layers on Si; Deposition rate of the Si content; List of Si-source gases.
ACCESSION #
4221247

 

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