Rapid thermal oxidation of thin nitride dielectrics deposited on rapid thermal nitrided

Itoh, S.; Lo, G.Q.
September 1992
Applied Physics Letters;9/14/1992, Vol. 61 Issue 11, p1313
Academic Journal
Examines the effect of rapid thermal and conventional wet oxidations on the dielectric breakdown and charge trapping characteristics of thin films. Deposition of thin films in rapid thermally nitrided polycrystalline silicon; Evidence of the superior time-dependent dielectric breakdown characteristics of the films.


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