TITLE

Rapid thermal oxidation of thin nitride dielectrics deposited on rapid thermal nitrided

AUTHOR(S)
Itoh, S.; Lo, G.Q.
PUB. DATE
September 1992
SOURCE
Applied Physics Letters;9/14/1992, Vol. 61 Issue 11, p1313
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the effect of rapid thermal and conventional wet oxidations on the dielectric breakdown and charge trapping characteristics of thin films. Deposition of thin films in rapid thermally nitrided polycrystalline silicon; Evidence of the superior time-dependent dielectric breakdown characteristics of the films.
ACCESSION #
4217949

 

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