TITLE

Anomalous diffusion of fluorine in silicon

AUTHOR(S)
Jeng, S.-P.; Ma, T.-P.
PUB. DATE
September 1992
SOURCE
Applied Physics Letters;9/14/1992, Vol. 61 Issue 11, p1310
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the anomalous diffusion of ion implanted fluorine (F) in silicon (Si). Use of secondary ion mass and thermal desorption spectroscopy; Characterization of the anomalous out-diffusion behavior; Reaction of migrant F species with native oxide and Si; Correlation between the Si oxyfluoride and thermally activated anomalous F migration.
ACCESSION #
4217946

 

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