Influence of the high voltage pulse shape on the plasma source ion implantation process

Speth, R.R.; Emmert, G.A.
October 1994
Applied Physics Letters;10/31/1994, Vol. 65 Issue 18, p2272
Academic Journal
Investigates the plasma source ion implantation (PSII) process. Influence of high voltage exponential and powered linear shutoff pulse shapes on implanted ion impact energy distribution; Application of a two-fluid model in the PSII process; Effect of charge exchange collision, temporal pulse shape and target charging on ion energy distribution.


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