TITLE

Influence of the high voltage pulse shape on the plasma source ion implantation process

AUTHOR(S)
Speth, R.R.; Emmert, G.A.
PUB. DATE
October 1994
SOURCE
Applied Physics Letters;10/31/1994, Vol. 65 Issue 18, p2272
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the plasma source ion implantation (PSII) process. Influence of high voltage exponential and powered linear shutoff pulse shapes on implanted ion impact energy distribution; Application of a two-fluid model in the PSII process; Effect of charge exchange collision, temporal pulse shape and target charging on ion energy distribution.
ACCESSION #
4207730

 

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