TITLE

Influence of plasma on silicon surface during low-energy plasma deposition process: The

AUTHOR(S)
Ivanco, J.; Thurzo, I.
PUB. DATE
November 1994
SOURCE
Applied Physics Letters;11/14/1994, Vol. 65 Issue 20, p2594
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the influence of plasma on silicon surface during low-energy plasma-enhanced chemical vapor deposition. Separation of deposition steps to enhance interface formation control; Creation of layer shielding Si surface from species bombardment; Spectral analysis of silicon capacitor with plasma-grown silicon[sub 3]nitrogen[sub 4].
ACCESSION #
4207714

 

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