Influence of plasma on silicon surface during low-energy plasma deposition process: The

Ivanco, J.; Thurzo, I.
November 1994
Applied Physics Letters;11/14/1994, Vol. 65 Issue 20, p2594
Academic Journal
Examines the influence of plasma on silicon surface during low-energy plasma-enhanced chemical vapor deposition. Separation of deposition steps to enhance interface formation control; Creation of layer shielding Si surface from species bombardment; Spectral analysis of silicon capacitor with plasma-grown silicon[sub 3]nitrogen[sub 4].


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