Improvement of grain size and deposition rate of microcrystalline silicon by use of very high

Finger, F.; Hapke, P.
November 1994
Applied Physics Letters;11/14/1994, Vol. 65 Issue 20, p2588
Academic Journal
Describes the improvements of grain size, deposition rate and Hall mobility of microcrystalline silicon (Si). Use of very high frequency glow discharge to provide favorable growth condition; Preparation of Si crystal by plasma enhanced chemical vapor deposition; Effect of plasma excitation frequency on Si growth condition and material properties.


Related Articles

  • High mobility hydrogenated and oxygenated microcrystalline silicon as a photosensitive material.... Faraji, M.; Gokhale, Sunil // Applied Physics Letters;6/29/1992, Vol. 60 Issue 26, p3289 

    Examines the preparation of hydrogenated and oxygenated microcrystalline silicon by radio frequency glow discharge method. Use of a mixture of silane, hydrogen, and oxygen; Determination of the Hall mobility for the films; Loss of photocarriers by the recombination process at the junction.

  • Reactive ion etching end-point determination by plasma impedance monitoring. Patel, V.; Singh, B. // Applied Physics Letters;10/19/1992, Vol. 61 Issue 16, p1912 

    Examines the use of impedance monitoring of radio frequency glow discharge to determine the end point of reactive ion etching. Change in the plasma composition for polycrystalline silicon; Process for increasing the signal to noise ratio; Application of reactive ion and plasma etching to large...

  • Equilibrium temperature and related defects in intrinsic glow discharge amorphous silicon. McMahon, T. J.; Tsu, R. // Applied Physics Letters;8/10/1987, Vol. 51 Issue 6, p412 

    We find the equilibrium temperature for intrinsic glow discharge amorphous silicon to be 195–200 °C. Defects left behind after fast cooling result in a temperature-dependent dc photoconductivity which shows small differences in the tail state recombination kinetics when compared to...

  • The breakdown and glow phases during the initiation of discharges for lamps. Pitchford, L.C.; Peres, I. // Journal of Applied Physics;7/1/1997, Vol. 82 Issue 1, p112 

    Demonstrates the importance of the source voltage and impedance during the takeover phase on the maintenance of the transient cold-cathode, glow discharge immediately after breakdown. Description of the model presented; Results from model calculations; Breakdown pulse; Afterglow; Takeover phase;...

  • High-performance electrode profile generation method. Elizondo, Juan M.; Benze, Jay W.; Moeny, William M.; Small, James G. // Review of Scientific Instruments;Apr1985, Vol. 56 Issue 4, p532 

    High-performance electrodes for gas discharge devices such as lasers often require surfaces of compound curvature which are both difficult to describe and difficult to manufacture. This paper describes a simple microcomputer method for generating sophisticated electrode shapes on a numerically...

  • High current density hollow cathode electron beam source. Rocca, J. J.; Szapiro, B.; Verhey, T. // Applied Physics Letters;5/11/1987, Vol. 50 Issue 19, p1334 

    An electron beam with current density greater than 30 A/cm2 and total current of 92 A has been generated in 5 μs pulses by accelerating the electrons from a glow discharge in a narrow gap between two grids. The ratio of the extracted electron beam current to discharge current is approximately...

  • Optogalvanic signals from argon metastables in a rf glow discharge. Murnick, D. E.; Robinson, R. B.; Stoneback, D.; Colgan, M. J.; Moscatelli, F. A. // Applied Physics Letters;2/27/1989, Vol. 54 Issue 9, p792 

    Laser optogalvanic (LOG) signals at 667.7, 751.5, and 696.5 nm from the 3 P1 and 3 P2 levels of Ar were studied at a pressure of 250 mTorr in a rf glow discharge. Signals with unexpected signs and time dependences were found. The results are interpreted as being due to radiative trapping effects...

  • Combination of glow-discharge and arc plasmas for CF[sub 4] abatement. Huang, Aimin; Xia, Guanguang; Spiess, Franz-Josef; Chen, Xiao; Rozak, Jeffery; Suib, Steven L.; Takahashi, Tomonori; Hayashi, Yuji; Matsumoto, Hiroshige // Research on Chemical Intermediates;2001, Vol. 27 Issue 9, p957 

    Decomposition of CF[sub 4] by glow-discharge and arc plasmas was studied using a tubular quartz reactor, a disk type, and a T-type quartz reactor. The effects of different metal electrodes, input voltage, and reactor type on the efficiency of CF[sub 4] total destruction (DRE) were studied. The...

  • Self-Maintained Glow Discharge in a Hypersonic Air Flow. Fomin, V. M.; de Roquefort, T. A.; Lebedev, A. V.; Ivanchenko, A. I. // Doklady Physics;Feb2000, Vol. 45 Issue 2, p84 

    Studies the self-maintained glow discharge in a hypersonic air flow. Setup used in the experiment; Discharge appearance in the hypersonic air flow; Voltage-current characteristics.


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics