TITLE

In situ spectroscopic ellipsometry of porous silicon layers annealed under ultrahigh vacuum

AUTHOR(S)
Larre, A.; Halimaoui, A.
PUB. DATE
September 1994
SOURCE
Applied Physics Letters;9/19/1994, Vol. 65 Issue 12, p1566
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Details an in situ spectroscopic ellipsometry measurement of porous silicon (PS) layers annealed under ultrahigh vacuum. Impact of hydrogen termination on the optical constants of PS layers; Effects of thermal annealing on the refractive index and absorption coefficient of samples; Factors contributing to changes in the optical properties of the material.
ACCESSION #
4207674

 

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