TITLE

Approach of selective nucleation and epitaxy of diamond films on Si(100)

AUTHOR(S)
Jiang, X.; Boettger, E.
PUB. DATE
September 1994
SOURCE
Applied Physics Letters;9/19/1994, Vol. 65 Issue 12, p1519
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines selective nucleation and epitaxy of synthetic diamond films on silicon. Use of microwave plasma assisted chemical vapor deposition; Details on silicon substrates coating patterned by a standard photolitography process; Advantages of the heteroepitaxial growth technique.
ACCESSION #
4207658

 

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