TITLE

Smooth, low-bias plasma etching of InP in microwave Cl[sub 2]/CH[sub 4]/H[sub 2] mixtures

AUTHOR(S)
Costantine, C.; Barratt, C.
PUB. DATE
December 1992
SOURCE
Applied Physics Letters;12/14/1992, Vol. 61 Issue 24, p2899
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines factors influencing the development of smooth low-bias plasma etching of InP by electron cyclotron resonance microwave discharges of Cl[sub 2]/Ch[sub 4]/H[sub 2]. Analysis on erosion of SiO[sub 2] masks; Implication of the process for laser mesa fabrication; Promotion of etching anisotropy by CH[sub 4] addition.
ACCESSION #
4203775

 

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