TITLE

Atmospheric photoassisted chemical vapor deposition of Si using ultraviolet-light irradiated

AUTHOR(S)
Mazumder, Motaharul Kabir; Takakuwa, Yuji
PUB. DATE
December 1992
SOURCE
Applied Physics Letters;12/14/1992, Vol. 61 Issue 24, p2881
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Proposes a photoassisted chemical vapor deposition process of silicon (Si). Excitation of a hydrogen carrier gas by ultraviolet light from low-pressure mercury lamps; Exemption of a SiH[sub 2]Cl[sub 2] reactant gas from irradiation; Analysis on the number of pyramidal hillocks, etch pits, growth rate and surface roughness.
ACCESSION #
4203769

 

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