TITLE

Silicon dioxide thin films prepared by chemical vapor deposition from tetrakis (dimethylamino)

AUTHOR(S)
Maruyama, Toshiro; Shirai, Toshimasa
PUB. DATE
August 1993
SOURCE
Applied Physics Letters;8/2/1993, Vol. 63 Issue 5, p611
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the use of chemical vapor deposition method in predisposing silicon dioxide thin films. Accounts of several source material for silicon dioxide thin films; Conversion of the incoming oxygen gas through an ozonator; Utilization of multipurpose recording spectrophotometer in measuring ozone concentration of the oxygen gas flow rate.
ACCESSION #
4170314

 

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