TITLE

Two-dimensional hybrid model of inductively coupled plasma sources for etching

AUTHOR(S)
Ventzek, Peter L.G.; Sommerer, Timothy J.
PUB. DATE
August 1993
SOURCE
Applied Physics Letters;8/2/1993, Vol. 63 Issue 5, p605
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the two-dimensional hybrid model for inductively coupled plasma sources employed in etching. Details of the two-dimensional hybrid model; Inclusions of several simulations for radiofrequency discharges; Accounts of the hydrodynamic-chemical kinetics stimulation.
ACCESSION #
4170312

 

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