TITLE

Three-dimensional electron probe roughness analysis of InP sidewalls processed by reactive ion

AUTHOR(S)
Matsutani, Akihiro; Koyama, Fumio
PUB. DATE
January 1995
SOURCE
Applied Physics Letters;1/2/1995, Vol. 66 Issue 1, p64
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Presents a quantitative three dimensional measurement of sidewall roughness of InP etched by chlorine based reactive ion beam etching (RIBE). Effectiveness of RIBE; Discussion on sidewall roughness; Use of field emission electron probe surface roughness analyzer.
ACCESSION #
4167655

 

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