TITLE

Infrared radiometry for monitoring temperature of photoresist during dry etching

AUTHOR(S)
Dankner, Yair; Simhony, S.
PUB. DATE
October 1993
SOURCE
Applied Physics Letters;10/4/1993, Vol. 63 Issue 14, p1999
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Focuses on the infrared radiometry for monitoring the temperature of photoresist during dry etching. Use of dry etching; Components of the etching system; Advantages of infrared fiber-optic thermometry.
ACCESSION #
4164277

 

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