Model for the vaporization of mixed organometallic compounds in the metalorganic chemical vapor

Guangyao Meng; Gang Zhou
October 1993
Applied Physics Letters;10/4/1993, Vol. 63 Issue 14, p1981
Academic Journal
Proposes a model for the vaporization of mixed organometallic compounds from a single source for thin film metalorganic chemical vapor deposition (MOCVD). Provisions of mixed organometallic vaporizer; Ways to obtain proper film composition and growth rates; Role of organometallics in the rates of vaporization.


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