TITLE

Phase transformation mechanisms involved in excimer laser crystallization of amorphous silicon

AUTHOR(S)
Im, James S.; Kim, H.J.
PUB. DATE
October 1993
SOURCE
Applied Physics Letters;10/4/1993, Vol. 63 Issue 14, p1969
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the phase transformation mechanisms and resulting microstructures of excimer laser-induced crystallization of amorphous silicon (Si) films on silicon oxide (SiO[sub 2]). Significance of large-grained polycrystal Si films; Characteristics of the transformation mechanisms involved in the process; Purpose of using nonhydrogenated amorphous films.
ACCESSION #
4164267

 

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