Effects of electron beam during ion implantation and ion beam assisted deposition

Xianghong Liu; Tengcai Ma
October 1993
Applied Physics Letters;10/4/1993, Vol. 63 Issue 14, p1901
Academic Journal
Investigates the effects of continuous electron beam during ion implantation and ion beam assisted deposition. Techniques of material surface modification by ion beams; Use of electron beams; Reasons for the deep implantation range.


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