TITLE

Effects of electron beam during ion implantation and ion beam assisted deposition

AUTHOR(S)
Xianghong Liu; Tengcai Ma
PUB. DATE
October 1993
SOURCE
Applied Physics Letters;10/4/1993, Vol. 63 Issue 14, p1901
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the effects of continuous electron beam during ion implantation and ion beam assisted deposition. Techniques of material surface modification by ion beams; Use of electron beams; Reasons for the deep implantation range.
ACCESSION #
4164244

 

Related Articles

  • Electron flow in a relativistic electron beam pinched diode collective acceleration system. Nardi, E.; Markovitz, M.; Zinamon, Z. // Physics of Fluids (00319171);Aug88, Vol. 31 Issue 8, p2373 

    Investigations of the electron component of the composite collectively accelerated ion and electron beam produced in a relativistic electron beam pinch diode are reported. The experiments consisted of examining the K[sub a] x-ray signal induced by the propagating electron beam and comparing this...

  • Repetitive high current density pseudospark-produced ion beams. Jain, K.K.; Sharma, P.K. // Applied Physics Letters;3/29/1993, Vol. 62 Issue 13, p1466 

    Examines the operation of multigap pseudospark device filled with hydrogen or argon gas and ejected ion beam characteristics. Reaction of pseudospark during breakdown; Cause of the ion beam increase; Characteristics of pseudospark.

  • High-flux source of low-energy neutral beams using reflection of ions from metals. Cuthbertson, John W.; Motley, Robert W.; Langer, William D. // Review of Scientific Instruments;Nov92, Vol. 63 Issue 11, p5279 

    Reflection of low-energy (<100 eV) ions from surfaces can be applied as a method of producing high-flux beams of low-energy neutral particles, and is an important effect in several areas of plasma technology, such as in the edge region of fusion devices. We have developed a beam source based on...

  • Multiple pulsed ion and electron beams produced by the multiplate chamber. Jiang, Xing-liu; Xu, Ning // Review of Scientific Instruments;Jan1990, Vol. 61 Issue 1, p644 

    Intense pulsed ion and electron beams with energies below 100 keV are difficult to create using the normal "vacuum diode." In this paper, the generation of intense multiple pulsed ion and electron beams by the multiplate chamber (MPC) based on the field escalation effect is described. Various...

  • Improving ion beam quality by its interaction with electron beam. Abdelaziz, M. E.; Zakhary, S. G.; Abdelghaffar, A. M. // Review of Scientific Instruments;Apr92, Vol. 63 Issue 4, p2752 

    The influence of electrons interaction with ion beams extracted from rf source on the behavior of ion beam optics has been studied. Both theoretical and experimental studies show decrease of beam emittance and beam radius due to decrease of space-charge effect produced by partial neutralization...

  • Operation of a single column focused ion/electron beam system based on a dual ion/electron source. Chen, L. W.; Wang, Y. L. // Applied Physics Letters;10/12/1998, Vol. 73 Issue 15 

    A focused ion/electron beam system has been constructed by introducing a dual ion/electron point source into an optical column of electrostatic lenses. Ions are extracted from a W needle covered by liquid In while electrons are from the same source after the In has been in situ solidified. The...

  • Multichannel source of synthesized ion-electron flow. Bizioukov, A.A.; Kashaba, A.Y.; Sereda, K.N.; Tseluyko, A. Ph. // Review of Scientific Instruments;Dec1996, Vol. 67 Issue 12, p4117 

    Presents a multichannel source with cold electrodes generating spatially combined ion and electron beams with homogeneous profile of current density. Design of the source on the basis of a modified Penning cell; Anode configuration providing high current efficiency; Ion beam generation;...

  • Vapor deposition processes for amorphous carbon films with sp3 fractions approaching diamond. Cuomo, Jerome J.; Pappas, David L.; Bruley, John; Doyle, James P.; Saenger, Katherine L. // Journal of Applied Physics;8/1/1991, Vol. 70 Issue 3, p1706 

    Presents information on a study which examined trends in reported data on high sp³ fraction, nonhydrogenated amorphous diamond-like carbon films deposited by ion beam sputtering and laser vaporization. Film properties; Evaporation of carbon by electron beam heating; Los-energy deposition...

  • Formation and characterization of grain-oriented VO2 thin films. De Natale, J. F.; Hood, P. J.; Harker, A. B. // Journal of Applied Physics;12/15/1989, Vol. 66 Issue 12, p5844 

    Presents information on a study which prepared grain-oriented films of VO[sub2] to characterize the effects of film orientation on electrical and optical switching performance. Preparation of the VO[sub2] thin films by both reactive electron beam evaporation and reactive ion-beam sputtering;...

Share

Read the Article

Courtesy of VIRGINIA BEACH PUBLIC LIBRARY AND SYSTEM

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics