TITLE

Current density dependence of electromigration failure of submicron width, multilayer Al alloy

AUTHOR(S)
Oates, A.S.
PUB. DATE
March 1995
SOURCE
Applied Physics Letters;3/20/1995, Vol. 66 Issue 12, p1475
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the current density dependence of electromigration failure of Al alloy metallization systems. Various aspects of electromigration failure; Effect of the occurrence of electromigration; Causes of void and hillocks formation.
ACCESSION #
4156284

 

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