TITLE

Silver high-aspect-ratio micro- and nanoimprinting for optical applications

AUTHOR(S)
Buzzi, Stefano; Galli, Matteo; Agio, Mario; Löffler, Jörg F.
PUB. DATE
June 2009
SOURCE
Applied Physics Letters;6/1/2009, Vol. 94 Issue 22, p223115
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Metal direct nanoimprinting is a fabrication technique based on plastic deformation of ductile metals such as silver and gold pressed into a structured rigid mold. While this process can be exploited to manufacture metallic micro- and nanoparts by removing the mold after processing, it can also be used as a metallization method for producing two-dimensional metallo-dielectric composites. Dense silver-pillar arrays with diameters down to 140 nm, aspect ratios up to 13, and excellent uniformity over large areas were fabricated. The sample quality was confirmed by near-infrared optical reflectances of Si–Ag photonic crystals, which showed strong collective surface plasmon-polariton resonances.
ACCESSION #
41139434

 

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