The influence of point defects and inhomogeneous strain on the functional behavior of thin film ferroelectrics

Chang, L. W.; McMillen, M.; Gregg, J. M.
May 2009
Applied Physics Letters;5/25/2009, Vol. 94 Issue 21, p212905
Academic Journal
An attempt has been made to unequivocally identify the influence that inhomogeneous strain fields, surrounding point defects, have on the functional properties of thin film ferroelectrics. Single crystal thin film lamellae of BaTiO3 have been integrated into capacitor structures, and the functional differences between those annealed in oxygen and those annealed in nitrogen have been mapped. Key features, such as the change in the paraelectric-ferroelectric phase transition from first to second order were noted and found to be consistent with mean field modeling predictions for the effects of inhomogeneous strain. Switching characteristics appeared to be unaffected, suggesting that point defects have a low efficacy in domain wall pinning.


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