Fundamental mechanisms of oxygen plasma-induced damage of ultralow-k organosilicate materials: The role of thermal 3P atomic oxygen

Chaudhari, Mrunalkumar; Jincheng Du; Behera, Swayambhu; Manandhar, Sudha; Gaddam, Sneha; Kelber, Jeffry
May 2009
Applied Physics Letters;5/18/2009, Vol. 94 Issue 20, p204102
Academic Journal
Fourier transform infrared (FTIR) spectroscopy, x-ray photoelectron spectroscopy (XPS), and ab initio density functional theory-based molecular dynamics simulations demonstrate fundamental mechanisms for CH3 abstraction from organosilicate films by thermal O(3P). Ex situ FTIR analysis demonstrates that film exposure to thermal O(3P) yields chemical changes similar to O2 plasma exposure. In situ XPS indicates that exposure to thermal O(3P) yields O/OH incorporation in the organosilicate film concurrent with carbon loss from the surface region. These results are consistent with simulations indicating specific low kinetic barrier (<0.1 eV) reactions resulting in concurrent Si–C bond scission and Si–O bond formation.


Related Articles

  • Photoelectron spectroscopy of cold aluminum cluster anions: Comparison with density functional theory results. Lei Ma; Issendorff, Bernd v.; Aguado, Andrés // Journal of Chemical Physics;3/14/2010, Vol. 132 Issue 10, p104303 

    Photoelectron spectra of cold aluminum cluster anions Aln- have been measured in the size range n=13–75 and are compared to the results of density functional theory calculations. Good agreement between the measured spectra and the calculated density of states is obtained for most sizes,...

  • Electronic structures of WAlOy and WAlOy- (y = 2-4) determined by anion photoelectron spectroscopy and density functional theory calculations. Mann, Jennifer E.; Waller, Sarah E.; Jarrold, Caroline Chick // Journal of Chemical Physics;7/28/2012, Vol. 137 Issue 4, p044301 

    The anion photoelectron spectra of WAlOy- (y = 2-4) are presented and assigned based on results of density functional theory calculations. The WAlO2- and WAlO3- spectra are both broad, with partially resolved vibrational structure. In contrast, the WAlO4- spectrum features well-resolved...

  • Nuclear shielding constants by density functional theory with gauge including atomic orbitals. Helgaker, Trygve; Wilson, Philip J.; Amos, Roger D.; Handy, Nicholas C. // Journal of Chemical Physics;8/22/2000, Vol. 113 Issue 8 

    Recently, we introduced a new density-functional theory (DFT) approach for the calculation of NMR shielding constants. First, a hybrid DFT calculation (using 5% exact exchange) is performed on the molecule to determine Kohn-Sham orbitals and their energies; second, the constants are determined...

  • Molecular-orbital-free algorithm for excited states in time-dependent perturbation theory. Lucero, Melissa J.; Niklasson, Anders M. N.; Tretiak, Sergei; Challacombe, Matt // Journal of Chemical Physics;8/14/2008, Vol. 129 Issue 6, p064114 

    A nonlinear conjugate gradient optimization scheme is used to obtain excitation energies within the random phase approximation (RPA). The solutions to the RPA eigenvalue equation are located through a variational characterization using a modified Thouless functional, which is based upon an...

  • Chemically resolved electrical measurements using x-ray photoelectron spectroscopy. Cohen, Hagai // Applied Physics Letters;8/16/2004, Vol. 85 Issue 7, p1271 

    Noncontact chemically resolved electrical measurements are presented, capable of probing selected regions within fine heterostructures. Using a slightly modified x-ray photoelectron spectrometer, an effective means is demonstrated for measuring I–V curves of molecular layers, free of...

  • Half-cycle atomic layer deposition reaction studies of Al2O3 on In0.2Ga0.8As (100) surfaces. Milojevic, M.; Aguirre-Tostado, F. S.; Hinkle, C. L.; Kim, H. C.; Vogel, E. M.; Kim, J.; Wallace, R. M. // Applied Physics Letters;11/17/2008, Vol. 93 Issue 20, p202902 

    The reduction in III–V interfacial oxides by atomic layer deposition of Al2O3 on InGaAs is studied by interrupting the deposition following individual trimethyl aluminum (TMA) and water steps (half cycles) and interrogation of the resultant surface reactions using in situ monochromatic...

  • Interaction of iron atoms with the silicon surface coated with a native oxide layer. Gomoyunova, M. V.; Pronin, I. I.; Petrov, V. N.; Titkov, A. N. // Technical Physics;Aug2009, Vol. 54 Issue 8, p1210 

    The solid-phase epitaxy of iron silicide on the Si(111) surface coated with a native oxide layer is studied by high-resolution photoelectron spectroscopy using synchrotron radiation and by atomic force microscopy. The iron deposition dose changes up to 1 nm, and the annealing temperature changes...

  • Synchrotron x-ray photoelectron spectroscopy study on thermally grown SiO2/4H-SiC(0001) interface and its correlation with electrical properties. Watanabe, Heiji; Hosoi, Takuji; Kirino, Takashi; Kagei, Yusuke; Uenishi, Yusuke; Chanthaphan, Atthawut; Yoshigoe, Akitaka; Teraoka, Yuden; Shimura, Takayoshi // Applied Physics Letters;7/11/2011, Vol. 99 Issue 2, p021907 

    The correlation between atomic structure and the electrical properties of thermally grown SiO2/4H-SiC(0001) interfaces was investigated by synchrotron x-ray photoelectron spectroscopy together with electrical measurements of SiC-MOS capacitors. We found that the oxide interface was dominated by...

  • Time-resolved photoelectron spectroscopy on small tungsten cluster anions. Stanzel, J.; Burmeister, F.; Neeb, M. // Applied Physics A: Materials Science & Processing;Jul2010, Vol. 100 Issue 1, p21 

    We have studied the dynamics of photoexcited tungsten cluster anions $\mathrm{W}_{n}^{-}$ ( n=3,4,...,14) by means of time-resolved two-photon photodetachment spectroscopy. At an excitation energy of h νpump=1.56 eV the photoinduced dynamics is mainly dominated by fast electronic relaxation...


Read the Article


Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics