TITLE

All dielectric hard x-ray mirror by atomic layer deposition

AUTHOR(S)
Szeghalmi, Adriana; Senz, Stephan; Bretschneider, Mario; Gösele, Ulrich; Knez, Mato
PUB. DATE
March 2009
SOURCE
Applied Physics Letters;3/30/2009, Vol. 94 Issue 13, p133111
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Mirrors consisting of Al2O3 and Ta2O5 (∼2 nm film thickness) nanolaminates for hard x-ray wavelengths were produced by atomic layer deposition and characterized. Atomic force microscopy and transmission electron microscopy (TEM) proved extremely smooth surfaces of the mirrors, which are critical for highest reflectance. TEM images showed sharp interfaces between the oxides. The experimental x-ray reflectivity data were theoretically modeled and indicated minimal random thickness variations in the individual layers. Additionally, a depth graded sample with a total thickness of ∼4 μm for focusing applications in transmission (Laue) geometry and capillaries was coated.
ACCESSION #
37321886

 

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