Time-dependent gas phase kinetics in a hydrogen diluted silane plasma

Nunomura, S.; Yoshida, I.; Kondo, M.
February 2009
Applied Physics Letters;2/16/2009, Vol. 94 Issue 7, pN.PAG
Academic Journal
The gas phase kinetics in a high-pressure hydrogen diluted silane plasma has been studied at time scales of 10-2–6×102 s. The time-resolved gas phase composition shows the following kinetics at different time scales: silane decomposition and polysilane generation in <=2×10-1 s, nanoparticle formation and plasma density reduction in 10-1–100 s, polysilane accumulation in 100–102 s, and silane depletion and electrode heating in >=101 s. Disilane radicals are implied to be the dominant film precursors in addition to silyl radicals.


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