Growth of germanium crystals from electrodeposited gold in local crucibles

Ratchford, Joshua B.; Goldthorpe, Irene A.; McIntyre, Paul C.; Chidsey, Christopher E. D.
January 2009
Applied Physics Letters;1/26/2009, Vol. 94 Issue 4, pN.PAG
Academic Journal
We report a method of using electrodeposited gold catalysts to grow germanium crystals from germane by the vapor-liquid-solid mechanism. Lithographically defined local crucibles in a silicon oxide film on a silicon wafer were used as electrodes for the electrodeposition of gold. At 370 °C in the presence of germane, a germanium crystal grew from the gold-germanium eutectic in each local crucible. X-ray diffraction shows that the germanium crystals grew epitaxially from the silicon wafers. The addition of HCl to the reactive gas mixture during germanium crystal growth prevented germanium deposition on the surface of the silicon oxide film.


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