TITLE

Phase identification of self-forming Cu–Mn based diffusion barriers on p-SiOC:H and SiO2 dielectrics using x-ray absorption fine structure

AUTHOR(S)
Ablett, J. M.; Woicik, J. C.; Tőkei, Zs.; List, S.; Dimasi, E.
PUB. DATE
January 2009
SOURCE
Applied Physics Letters;1/26/2009, Vol. 94 Issue 4, pN.PAG
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
X-ray absorption fine structure spectroscopy has been used to study the chemical and structural properties of self-forming diffusion barrier layers from Cu-8 at. % Mn alloy films on porous low-k and thermally grown SiO2 dielectrics. For the porous low-k/Cu(Mn) system, we provide evidence that the interface is composed of MnSiO3 and MnO with near complete Mn segregation from the alloy film; however, we find that the self-forming process does not go to full completion on thermally grown SiO2 substrates.
ACCESSION #
36434932

 

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