Impact of air exposure on the chemical and electronic structure of ZnO:Zn3N2 thin films

Bär, M.; Ahn, K.-S.; Shet, S.; Yan, Y.; Weinhardt, L.; Fuchs, O.; Blum, M.; Pookpanratana, S.; George, K.; Yang, W.; Denlinger, J. D.; Al-Jassim, M.; Heske, C.
January 2009
Applied Physics Letters;1/5/2009, Vol. 94 Issue 1, p012110
Academic Journal
The chemical and electronic surface structure of ZnO:Zn3N2 (ZnO:N) thin films with different N contents was investigated by soft x-ray emission spectroscopy. Upon exposure to ambient air (in contrast to storage in vacuum), the chemical and electronic surface structure of the ZnO:N films changes substantially. In particular, we find that the Zn3N2/(Zn3N2+ZnO) ratio decreases with exposure time and that this change depends on the initial N content. We suggest a degradation mechanism based on the reaction of the Zn3N2 content with atmospheric humidity.


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