Nanoscale lithography with frequency-modulation atomic force microscopy

Hamada, Masayuki; Eguchi, T.; Akiyama, K.; Hasegawa, Y.
December 2008
Review of Scientific Instruments;Dec2008, Vol. 79 Issue 12, p123706
Academic Journal
A lithographic method to draw nanoscale structures by repetitive depositions of the tip material by field evaporation has been developed based on frequency-modulation atomic force microscopy (FM-AFM). Because of high stiffness of quartz tuning forks, a force sensor in the AFM, unwanted mechanical contact of the AFM tip with the substrate was prevented. Precise control of the tip-substrate gap distance with FM-AFM and a gold tip sharpened with focused ion beam enable us to deposit gold dots as small as ∼20 nm in size and construct nanoscale patterns.


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