Micron-scale width multislot plasma cathode

Yarmolich, D.; Vekselman, V.; Gurovich, V. Tz.; Gleizer, J. Z.; Felsteiner, J.; Krasik, Ya. E.
December 2008
Physics of Plasmas;Dec2008, Vol. 15 Issue 12, p123507
Academic Journal
High-current electron beam (∼1.5 kA, ∼30 A/cm2, ∼200 keV, ∼300 ns) generation in a diode with a micron-scale width multislot cathode is reported. The cathode operation is based on plasma formation inside slots formed by a stack of glass plates interlaid with 25 μm Cu foils. It was shown that the plasma formation is initiated at the beginning of the accelerating pulse with electric field ≤104 V/cm. The plasma density and temperature were found to be ∼1015 cm3 and ∼7 eV inside the slots and ∼1014 cm-3 and ∼7 eV at the vicinity of the slots output. The dependence of the plasma parameters inside the slots upon the slot’s width as well as the control of the extracted electron beam parameters by varying the slot’s width and the distance between slots have been studied.


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