TITLE

Optical nanolithography using a scanning near-field probe with an integrated light source

AUTHOR(S)
Kingsley, James W.; Ray, Sumon K.; Adawi, Ali M.; Leggett, Graham J.; Lidzey, David G.
PUB. DATE
November 2008
SOURCE
Applied Physics Letters;11/24/2008, Vol. 93 Issue 21, p213103
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
An ultracompact near-field optical probe is described that is based on a single, integrated assembly consisting of a gallium nitride (GaN) light-emitting diode (LED), a microlens, and a cantilever assembly containing a hollow pyramidal probe with a subwavelength aperture at its apex. The LED emits ultraviolet light and may be used as a light source for near-field photolithographic exposure. Using this simple device compatible with many commercial atomic force microscope systems, it is possible to form nanostructures in photoresist with a resolution of 35 nm, corresponding to λ/10.
ACCESSION #
35605066

 

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