Multiple pulse thermal damage thresholds of materials for x-ray free electron laser optics investigated with an ultraviolet laser

Hau-Riege, Stefan P.; London, Richard A.; Bionta, Richard M.; Soufli, Regina; Ryutov, Dmitri; Shirk, Michael; Baker, Sherry L.; Smith, Patrick M.; Nataraj, Pradeep
November 2008
Applied Physics Letters;11/17/2008, Vol. 93 Issue 20, p201105
Academic Journal
Optical elements to be used for x-ray free electron lasers (XFELs) must withstand multiple high-fluence pulses. We have used an ultraviolet laser to study the damage of two candidate materials, crystalline Si and B4C-coated Si, emulating the temperature profile expected to occur in optics exposed to XFEL pulses. We found that the damage threshold for 105 pulses is ∼20% to 70% lower than the melting threshold.


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