High-resolution characterization of defects in oxide thin films

Nikiforov, Maxim N.; Brukman, Matthew J.; Bonnell, Dawn A.
November 2008
Applied Physics Letters;11/3/2008, Vol. 93 Issue 18, p182101
Academic Journal
Nanometer sized defects in thin HfOx films are detected by atomic force microscopy facilitated leakage current measurements. Differences in the electrical properties of individual defects were distinguished. The effects of two mechanisms that localize the tip-sample interaction and increase spatial resolution were calculated. The expected increase in tip-sample current due to stress induced phase transformations and band gap narrowing has been calculated, and a behavior diagram is presented that shows the pressure necessary to generate a detectable current increase as a function of tip radius.


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