Manufacturable source mask optimization

Himel, Marc D.; Carriere, James T. A.; Schellenberg, F. M.; Granik, Y.
November 2008
Microlithography World;Nov2008, Vol. 17 Issue 4, p6
Trade Publication
The article demonstrates the technology for co-optimization of optical and process correction (OPC) photomasks and pixelated source maps. Since the OPC features can be adapted to the actual source used, optimization procedures can be broaden to entail optimizing the source for the particular layout pattern on the photomask. It also tackles the creation, fabrication and verification of the diffractive optical element (DOE).


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