TITLE

Manufacturable source mask optimization

AUTHOR(S)
Himel, Marc D.; Carriere, James T. A.; Schellenberg, F. M.; Granik, Y.
PUB. DATE
November 2008
SOURCE
Microlithography World;Nov2008, Vol. 17 Issue 4, p6
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article demonstrates the technology for co-optimization of optical and process correction (OPC) photomasks and pixelated source maps. Since the OPC features can be adapted to the actual source used, optimization procedures can be broaden to entail optimizing the source for the particular layout pattern on the photomask. It also tackles the creation, fabrication and verification of the diffractive optical element (DOE).
ACCESSION #
35066523

 

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