Uniformly dimerized C60 film prepared by deposition under in situ photoirradiation

Tanimoto, H.; Yamada, K.; Mizubayashi, H.; Matsumoto, Y.; Naramaoto, H.; Sakai, S.
October 2008
Applied Physics Letters;10/13/2008, Vol. 93 Issue 15, p151919
Academic Journal
C60 films with thicknesses of 100–480 nm were deposited on Si reed substrates under in situ photoirradiation. In anelasticity measurements, no internal friction peaks associated with rotational motions of the C60 molecules were observed, and Young’s modulus was 1.5 times larger than that of a pristine C60 material. X-ray diffraction patterns suggested that the face-centered cubic lattice was contracted by about 3% and locally distorted from the pristine C60 material. Raman spectra very similar to those reported for dimerized C60 were also obtained. These characteristics recovered to those of the pristine C60 materials after annealing the C60 films at 523 K. These results indicate uniform dimerization in C60 films deposited under in situ photoirradiation.


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