Deposition sequence dependent variation in interfacial chemical reactions between 8-hydroxyquinolatolithium and Al

Lee, Young Mi; Park, Yongsup; Yi, Yeonjin; Won Kim, Jeong
September 2008
Applied Physics Letters;9/22/2008, Vol. 93 Issue 12, p123301
Academic Journal
The chemical reactions between 8-hydroxyquinolatolithium (Liq) and Al were investigated by using high resolution synchrotron radiation photoelectron spectroscopy. Unlike the LiF/Al case, two opposite deposition sequences (Al/Liq versus Liq/Al) give different interface reactions. When Al is deposited on a Liq layer, there occurs a strong reaction between Liq and Al, which accounts for a clear peak shift in the Li 1s core level. On the other hand, an interface-localized charge transfer without Li 1s splitting occurs with the reversed deposition sequence. The former strong interface reaction can generate ionic Li as a dopant material in Liq layer, causing band bending.


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