Projecting deep-subwavelength patterns from diffraction-limited masks using metal-dielectric multilayers

Yi Xiong; Zhaowei Liu; Xiang Zhang
September 2008
Applied Physics Letters;9/15/2008, Vol. 93 Issue 11, p111116
Academic Journal
We utilize a metal-dielectric multilayer structure to generate deep-subwavelength one-dimensional and two-dimensional periodic patterns with diffraction-limited masks. The working wavelength and the pattern are set by the flexible design of the multilayer structure. This scheme is suitable to be applied to deep-subwavelength photolithography. As an example, we numerically demonstrate pattern periods down to 50 nm under 405 nm light illumination.


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