TITLE

Electrical characteristics and conduction mechanisms of metal-insulator-metal capacitors with nanolaminated Al2O3–HfO2 dielectrics

AUTHOR(S)
Shi-Jin Ding; Jun Xu; Yue Huang; Qing-Qing Sun; Zhang, David Wei; Ming-Fu Li
PUB. DATE
September 2008
SOURCE
Applied Physics Letters;9/1/2008, Vol. 93 Issue 9, p092909
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Electrical characteristics of metal-insulator-metal capacitors with various Al2O3–HfO2 nanolaminates are investigated. The results indicate that the breakdown field decreases with increasing the HfO2 individual-layer (IL) thickness. Concerning the same dielectric composition, the insulator with a thinner HfO2 IL also exhibits a significant improvement in the electrical breakdown and leakage characteristics. This is attributed to enhanced crystallization of the thicker HfO2 ILs. The insulator with alternate 1 nm Al2O3 and 5 nm HfO2 exhibits a breakdown field of 3.85 MV/cm at 125 °C, and a leakage current of 9.6×10-8 A/cm2 at 1 MV/cm and 200 °C. Further, it is revealed that the conduction mechanism in the high field range is dominated by the Poole–Frenkel emission with intrinsic trap energy of 1.91 eV.
ACCESSION #
34360669

 

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