TITLE

Local strain measurement in a strain-engineered complementary metal-oxide-semiconductor device by geometrical phase analysis in the transmission electron microscope

AUTHOR(S)
Chung, Jayhoon; Lian, Guoda; Rabenberg, Lew
PUB. DATE
August 2008
SOURCE
Applied Physics Letters;8/25/2008, Vol. 93 Issue 8, p081909
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Local strains in the channel and source/drain (S/D) of an advanced complementary metal-oxide-semiconductor device were measured by the geometric phase analysis applied to high resolution transmission electron microscope images. Two-dimensional strain maps were reconstructed for a 45 nm p-type metal-oxide-semiconductor device which was strain-engineered using a recessed Si0.82Ge0.18 S/D. Lateral strains were uniform across the channel but vertical strains were found to vary considerably in the channel. Measured strains were used to estimate stresses and hole mobility enhancements.
ACCESSION #
34198857

 

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