TITLE

Sub-30-nm patterning on quartz for imprint lithography templates

AUTHOR(S)
Srinivasan, Charan; Hohman, J. Nathan; Anderson, Mary E.; Weiss, Paul S.; Horn, Mark W.
PUB. DATE
August 2008
SOURCE
Applied Physics Letters;8/25/2008, Vol. 93 Issue 8, p083123
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
A parallel and economical method for obtaining nanoscale features on large-area quartz substrates has been developed for use in nanoimprint lithography template fabrication. Self-assembled multilayer films (molecular rulers) are used in conjunction with photolithographically defined metallic features to generate precise nanogaps with sub-30-nm resolution on quartz substrates. These nanopatterns are then transferred to the quartz substrates using the metallic thin films as etch masks.
ACCESSION #
34198762

 

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