TITLE

Accelerating both sparse and dense OPC computation

AUTHOR(S)
Albertalli, Charlie; Word, James
PUB. DATE
August 2008
SOURCE
Microlithography World;Aug2008, Vol. 17 Issue 3, p2
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article discusses the benefits of employing optical proximity correction (OPC) processing based on layer density and high-performance computing platforms to control mask cost and turnaround time. Among the factors considered by OPC techniques in assessing the pattern are pellicle and optics. One essential element to performing OPC and computational lithography (CL) techniques is said to be simulating the intensity of the light at the wafer plane. Also examined are basic approaches to the Hybrid High Performance Compute Farm (HCF) architecture.
ACCESSION #
33832407

 

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