Integrating III-V on silicon for future transistor applications

Chau, Robert
July 2008
Solid State Technology;Jul/Aug2008, Vol. 51 Issue 7, p30
Trade Publication
The article discusses the study of using non-silicon materials to replace silicon as the future transistor channel material and their integration onto silicon. Silicon manufacturers have explored various electronic materials and integrated them to silicon complementary metal-oxide semiconductors (CMOS) transistors to improve device performance and enhance energy efficiency.


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