TITLE

Integrating III-V on silicon for future transistor applications

AUTHOR(S)
Chau, Robert
PUB. DATE
July 2008
SOURCE
Solid State Technology;Jul/Aug2008, Vol. 51 Issue 7, p30
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article discusses the study of using non-silicon materials to replace silicon as the future transistor channel material and their integration onto silicon. Silicon manufacturers have explored various electronic materials and integrated them to silicon complementary metal-oxide semiconductors (CMOS) transistors to improve device performance and enhance energy efficiency.
ACCESSION #
33142704

 

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