TITLE

OPC for contacts

AUTHOR(S)
Samuels, Don; Stobert, Ian
PUB. DATE
May 2008
SOURCE
Microlithography World;May2008, Vol. 17 Issue 2, p17
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Th article discusses the use of optical proximity correction (OPC) to optimize contacts and vias. In the printing industry, OPC is an approach that enables production in a low k1 environment. OPC normally tries to change the design shapes to enable a simulated image to correspond the design accurately. It is inferred that through the contact level OPC approach, simple is more favorable every so often. According to the article, contact OPC with inverse serifs might be a better choice for printing tightly-spaced layouts.
ACCESSION #
32061498

 

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