TITLE

Mask specifications: It's not getting any easier

AUTHOR(S)
Mack, Chris A.
PUB. DATE
May 2008
SOURCE
Microlithography World;May2008, Vol. 17 Issue 2, p12
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article reports on how and why mask specifications are moving up at an extensively faster rate than the minimum half-pitch of the device. The eight edition of the International Technology Roadmap for Semiconductors was finished in 2007, stating a goal to build a mutual vision of the direction of semiconductor technology through the next 15 years. It is the author's view that masks will be more difficult to make in the next five years.
ACCESSION #
32061496

 

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