TITLE

Thermal aberration control

AUTHOR(S)
Nakashima, Toshiharu; Ohmura, Yasuhiro; Ogata, Taro; Uehara, Yusaku; Matsuyama, Tomoyuki; Magoon, Holly H.
PUB. DATE
May 2008
SOURCE
Microlithography World;May2008, Vol. 17 Issue 2, p4
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
20080501The article discusses thermal aberration control by Nikon. It reports that modernistic lithography exposure tools need high amounts of output and greater resolution efficiency. To meet these essential requirements, high powered lasers with off-axis illumination strategies are utilized. However, the augmented power from projection lens result in thermal aberrations. To solve this, Nikon uses two techniques, namely advanced lens control system and infrared aberration control system.
ACCESSION #
32061494

 

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