PEB plate optimization for CD uniformity

Ruck, Kirsten; Weichert, Heiko; Hornig, Steffen; Finger, Frank; Fleischer, Göran; Hetzer, Dave
February 2008
Microlithography World;Feb2008, Vol. 17 Issue 1, p8
Trade Publication
The article discusses a study on post exposure bake (PEB) plate optimization. The article presents PEB as one of the main litho contributors to critical dimension (CD) nonuniformity for processes using resists with moderate or high PEB sensitivity. The study found out that a PEB plate optimization system using scatterometry CD data on bare silicon test wafers reduces more effectively the CD nonuniformity of production wafers than previous methods of calibrating temperatures.


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