TITLE

Double patterning lithography: The bridge between low k1 ArF and EUV

AUTHOR(S)
Finders, Jo; Dusa, Mircea; Hsu, Stephen
PUB. DATE
February 2008
SOURCE
Microlithography World;Feb2008, Vol. 17 Issue 1, p2
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
The article focuses on the concepts of double patterning lithography (DPL). Different double patterning schemes are proposed for flash memory and dynamic random access memory (DRAM) applications, specifically the two litho and etch step or through the use of a sacrificial spacer layer. It is stated that DPL may pose special problems of design, integration and metrology but it may be a bridge technology leading back to single exposure extreme ultraviolet (EUV) lithography.
ACCESSION #
30055106

 

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